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Nanoimprint Lithography
    Pattern Transfer and Stability
Defect Metrology
Thermal Management of Active Nanodevices
 
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Thermal Management of Active Nanodevices

 

Introduction

  • Next generation active nanodevices will enable greater functionality in smaller packages, providing the basis for a broad range of high tech products.
  • One of the barriers to this innovation is heat (power) dissipation, i.e., the problem of thermal management.
  • Thermal conductivity/diffusivity in complex geometries requires measurement techniques beyond the current state of the art.
  • Measurements that can provide insight into the effects of defects, interfaces, and molecular anisotropy on the thermal characteristics of nanodevices are critically needed.
Emerging Technologies
 

Objective

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Schematic of a VCSE laser
  • To develop measurement techniques for characterizing the thermal properties of polymeric materials in active nanodevices as a function of defects, interfaces, and nanostructure.
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    NIST Role

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  • Develop practical ways to extend the capability of current thermal conductivity/diffusivity measurement instrumentation, e.g., via combinations of current techniques with controlled testbeds
  • Develop appropriate testbeds, with controlled defects, interfaces, molecular anisotropy, and 3-dimensional geometries, to enable quantification of nanoscale effects, e.g., spatial confinement of phonons at the nanoscale and thermal boundary resistance
  • Thermal AFM of hotspot
     

    Approach

     
    Combi 3-omega/dielectric setup
  • Combinatorial Simultaneous Dielectric and Thermal Diffusivity (SDTD) Spectrometer to obtain the thickness dependence of the thermal conductivity and heat capacity.
  • Defects, controlled interfaces, controlled thermal conductivity of phases, and long range order effects using a Testbed based on controlled geometry Block Copolymers (BCPs) with selective filling of nanoparticles for localized enhancement of thermal conductivity.
  • Block copolymer strategies
     
     

    NIST Contributors

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    Chad R. Snyder*
    Kirt Page
    Alamgir Karim
    Joong Tark Han
    Brian Berry
    Eric J. Amis
     

    Collaborators:

    Ho-Cheol Kim (IBM Almaden)
     
     
     
     
     
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    Nanostructured Materials Group
    Polymers Division
    Materials Science and Engineering Laboratory

     
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