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Organic Electronics
    Moisture Transport through Ultra-Low Permeation Barriers
    Chemistry and Orientation with NEXAFS Spectroscopy
Nanoimprint Lithography
  Pattern Transfer and Stability
Polymers for Next-Generation Lithography
  Dissolution Fundamentals
  Surface and Bulk Chemistry of Chemically Amplified Photoresists
  NIST-Industry Partnerships
Dimensional Metrology with Small Angle X-ray Scattering
  Sidewall Angle Metrology
  Dimensional Changes during Fabrication
Characterization of Porous Low-k Dielectric Thin Films
 
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Nanoimprint Lithography

 

Introduction

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Nanoimprint lithography (NIL) has emerged as a viable next generation lithography (NGL) capable of transferring physical patterns smaller than 5 nm into a polymeric film. The production of nanoscale structures enabled by NIL raises new metrology challenges, as the ability to pattern now exceeds the ability to measure and/or evaluate material properties. The objective of this project is to develop high- resolution metrologies that facilitate the development of NIL.
Examples of NIL pattern resolution
Examples of NIL pattern resolution

Objective

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1. Short term
Develop CD-SAXS as a high resolution shape metrology to assess the fidelity of pattern transfer between the mold and imprint for NIL processes and materials
2. Long term
Develop supporting mechanical and physical property metrologies, that when coupled with highly accurate CD-SAXS shape measurements, facilitate the fabrication & optimization of functional nanoscale imprinted devices ->Accurate shape and property measurements in nanostructures <-
CD-SAXS
 

NIST Role

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  • Understand the materials, interface, and confinement limitations to pattern resolution in nanoimprint processes
  • Develop new mechanical and physical property measurements for imprinted polymeric nanostructures
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    Highlights

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    Demonstrate Fidelity of Pattern Transfer Concept
    Demonstrate Fidelity of Pattern Transfer Concept
     
    Sample Rotation for 3-D Line Shape
    Sample Rotation for 3-D Line Shape
     
    Thermal Stability of Imprinted Nanostructures
    Thermal Stability of Imprinted Nanostructures

    Customers and Impact

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    • NIL technique receiving world-wide attention
    ITRS
    Nano-imprint lithography is slated for the 32-nm node (2009) on the ITRS roadmap
    Customers and Impact
    10 Emerging Technologies That Will Change the World
     
    • Molecular Imprints & Nanonex on Silicon Strategies “60 Emerging Start-Ups” list for 2004
    • Invited Nanoimprint Lecture at MRS Fall 2004 “Innovations for Sub-100 nm Patterning” session
    • Active collaboration from several industrial and academic leaders in NIL technology
    Customers and Impact
     

    NIST Contributors

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    Christopher Soles*
    Ronald Jones
    Tengjiao Hu
    Wen-li Wu
    Eric Lin
    Stephanie Hooker
    Colm Flannery
     

    Collaborators:

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    Diego Casa (1)
    Rainer Kolb (2)
    Alexei Sokolov (3)
    Stella Pang (4)
    Ron Reano (4)
    C. Grant Willson (5)
    Steve Johnson (5)
    Martha Sanchez (6)
    Larry Koecher (7)
    Doug Resnick (8)
    Kevin Nordquist (8)
     
     
     
     
     
     
     
     
     
     
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    Electronics Materials Group
    Polymers Division
    Materials Science and Engineering Laboratory

     
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