Dimensional Metrology with Small Angle X-ray Scattering
Introduction
Industry lacks capability to rapidly measure
sub-50 nm structures with sub-nm precision. “Grand Challenge”
NIST developed alternative for critical dimension metrology
with Small Angle X-ray Scattering (CD-SAXS)
Objective
To
develop CD-SAXS methodology to quickly, quantitatively, and
non-destructively measure critical dimensions and feature shape
with sub-nanometer resolution on production scale test samples.
NIST Role
Develop capability of CD-SAXS to meet demands
outlined in the ITRS Roadmap for metrology.
Develop protocols for measuring critical parameters in test
patterns for sub-50 nm fabrication
Develop a laboratory scale device as a prototype
Highlights
CD-SAXS shown to be viable technology
Sub-nm precision in periodicity and line width
Sample measured non-destructively on order of seconds
Design and purchase of lab-scale system
Customers and Impact
Industry
Press and Recognition:
EE Times, Semiconductor International, Micro Magazine
